The conductive shield film is to prevent the interference of high voltage field strength on the component. The design principle of the conductive shield film is to minimize the distributed capacitance between the interference source and the receptor by using the shield, so as to reduce the influence of the interference source on the receptor. Conductive shielding film materials are a variety of materials used between the heat source and the radiator, by eliminating the air between the heat source and the radiator, so that the heat of the electronic device is distributed more evenly and the heat dissipation efficiency is accelerated. Generally, all kinds of thermal interface materials need to have good thermal conductivity and surface wettability.

First, there are many types of transparent conductive films, but with practical application value or Oxide film predominates, such as Indium-Tin oxide film (Indium-tin-oxide, referred to as ITO film), ITO transparent conductive film is deposited on the surface of the substrate by physical or chemical methods, and the substrate material is generally ultra-thin glass. It is also called ITO transparent conductive film glass.

ITO transparent conductive film glass is a new material successfully developed in the early 1970s in the world, which is a member of the electrical and electronic glass family widely used in the information industry, and has an important position in the information industry. Transparent conductive film glass as the upstream products of the flat display industry, its application is very wide, not only the key components in LCD (liquid crystal display), but also in other high-level flat displays as transparent glass electrodes, and is closely related to civilian consumer products (such as building materials, automobiles, TVS, etc.). The process can be further extended to the production of any conductive glass required by the market.

Two, transparent conductive film has the following characteristics:

1, good electrical conductivity, resistivity up to 10-4Ω·cm;

2, high hardness, wear resistance, chemical corrosion resistance;

3, good processing performance;

4, the visible light transmittance is high, up to 85%;

5, has good absorption of ultraviolet light, absorption rate is not less than 85%;

6, has good reflectance to infrared, reflectance is not less than 80%;

7, it has attenuation for microwave, and the attenuation rate is not less than 85%. PART 02 Transparent conductive film glass PRODUCTION /PRODUCTION

Introduction to the production process

There are three essential conditions for the production of ITO transparent conductive film glass, namely: coating equipment, ITO target and transparent ultra-thin glass (0.4-1.3mm). ITO transparent conductive film preparation is the core technology of the process, it can use a variety of methods, mainly have magnetron sputtering method (DC magnetron sputtering and RF magnetron sputtering), vacuum evaporation method (resistance heating or electric beam heating), impregnation method, chemical vapor deposition method, spraying method and other five processes. At present, the most widely used is DC magnetron sputtering, which is used to continuously plate ITO film. It has the advantages of uniform film thickness, easy control, good film repeatability, stability, dry continuous production, plating large area, substrate and target mutual position can be placed arbitrarily according to ideal design, can be prepared at low temperature dense film layer, can use alloy target reactive sputtering, can also use oxidation target direct sputtering and so on. The process is suitable for dry large-scale industrial production. ITO transparent conductive film glass has good quality, many specifications and varieties, and low energy consumption.

First prepare the specified thickness and size of (0.4-1.3mm) ultra-thin glass sheet, pre-treated by washing, ultrasonic cleaning, into the vacuum chamber, first SiO2 plating, and then into the ITO coating chamber plating ITO film, after heating curing and annealing to obtain the finished product. In the whole process of ITO conductive film glass, Ar (argon) and O2 (oxygen) gas are passed through clean and dustless under high vacuum, and after magnetron sputtering, oxidized steel tin film is deposited on the surface of glass substrate and heated and annealed.

Production equipment:

The production of high-quality ITO transparent conductive film glass is closely related to the selection of good equipment. At present, Japan, the United States, Germany and other industrial developed countries mostly use the magnetron sputtering multi-chamber in-line tandem process equipment line to produce ITO glass. The glass substrate frame is vertical double-sided, and can continuously move the coating operation, and the production process is fully automatic control. At present, the equipment lines used by domestic manufacturers are equipment lines produced by companies in the United States, Germany, Japan and Shenyang and Shenzhen in China.

Before 1993, only Shenzhen South Asia Company introduced an American equipment line in the 1980s, with an annual output of 30,000 m2ITO conductive film glass. In 1994, Shenyang Vacuum Technology Research Institute cooperated with Shenzhen Nanya Company to successfully develop the automatic transparent conductive film glass production line with an annual output of 120,000 m2TD-750. In 1995, Shenzhen and Guangzhou introduced three ITO conductive film glass production lines from German and Japanese companies, making the national annual output reach 400,000 m2. With the domestic lines in Shijiazhuang, Wuhu, Shenzhen, Jiangsu Jintan and other places have been put into production, and some manufacturers in Taiwan and South Korea have transferred their existing production lines to the mainland, China's ITO transparent conductive film glass production capacity has grown rapidly, and the production capacity reached nearly 10 million square meters (9.53 million) in 2003